Nanoprobe Imaging Project
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Dr. John Moreland with students Qinzi Ji, Daniel Porpora,
and Todd Lammers (rear)
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Technical Accomplishments
FY 2001
FY 2000
Project Goals
This project develops scanned-probe microscopy (SPM) and micro-electromechanical
systems (MEMS) for nanometer-scale magnetic measurements in support
of the magnetic data storage industry. Project members perform research
to understand and relate SPM images and MEMS magnetometer measurements
to the performance of magnetic materials and devices for future
recording technologies. The project develops ultra-small magnetic-force
microscopy tips for imaging recording heads and media at a resolution
of 20 nanometers. Quantitative field mapping of heads and media
is based on electromechanical detection of magnetic resonance. MEMS
magnetometers with integrated specimens and high sensitivity are
being developed. In the next few years, the project will work on
a "magnetic-resonance spectrometer on a chip" to achieve
magnetic-resonance imaging resolution of 1 nanometer on ferromagnetic
thin films. Recent research includes the development of new ferromagnetic
resonance (FMR) spectrometers based on calorimetry, torque, and
transfer of spin angular momentum. Such sensors can be integrated
with atomic-force microscopes for imaging of local DC and RF magnetic
fields. The project also develops single
molecule manipulation and measurement techniques
(SM3). Currently, there is a lack of tools for isolating and probing
the behavior and structure of single molecules to determine the
function of DNA, RNA, and proteins. This program will advance single-molecule
metrology by developing a novel bio-nanoelectromechanical systems
platform that integrates electrical, optical, and spectroscopic
technologies.
Customer Needs
The National Storage Industry Consortium (NSIC) recently drafted
a recording-head metrology roadmap that calls for high-resolution,
quantitative magnetic microscopes and magnetometers that go beyond
the limitations of current technology. Magnetic measurement systems
have become increasingly complex. Our expertise in magnetism, probe
microscopy, and clean-room microfabrication techniques helps move
instruments from the development stage to routine operation in the
industrial laboratory and on the factory floor. Industry also looks
to NIST for fundamental constants and representations of magnetic
units as it pushes to smaller time and length scales. The physics
of nanometer-scale magnetism must be explored so that industry can
make the right choices for recording at densities of over 100 gigabits
per square centimeter. In order to improve upon magnetic force microscopy,
our project is focusing on specialized magnetic-force-microscope
(MFM) tips for imaging heads and media. Ultra-small tips are being
developed for magnetic image resolution of 10 nanometers. We are
looking at new technologies for making very sharp probe tips and
for controlling nanoscale magnetic structure near the tip. In addition,
more sensitive MFM instruments are being developed.
Quantitative field mapping of heads and media can be done with
tiny field probes based on electromechanical detection of magnetic
resonance. We are developing ways to attach sub-micrometer magnetic
resonance particles to ultra-sensitive cantilevers and to position
particles a few nanometers from the sample surface. We are developing new
tools for measurements of nanoscale magnetic
phenomena and representations of magnetic units for the next generation
of data-storage devices. We are developing MEMS magnetometers with
integrated magnetic samples that can offer tremendous gains in magnetic-moment
sensitivity. We have broadened our clean-room fabrication capabilities
to include MEMS bulk and surface micromachining of Si.
Technical Strategy
Our plans over the next five years are to demonstrate "magnetometers
on a chip" based on MEMS devices that will enable us to create
instruments that have superior performance compared to current magnetic-measurement
methods. Our new micromachining facility, in association with the
Electromagnetic Technology Division, is now operational. The facility
is at the state of the art, providing the tools necessary for bulk
and surface micromachining on Si wafers.
Scanning Probe Development
In order to improve upon scanning probe microscopes such as MFM
and keep pace with industry needs, we are focusing on specialized
MFM tips for imaging heads and media. Ultra-small tips are currently
being developed for magnetic-image resolution of 20 nanometers.
We are looking at new technologies for fabricating, controlling,
and measuring nanometer-scale magnetic structures near the probe
tip. In particular, MFM resolution can improve only with the development
of more sensitive cantilevers for measuring the small magnetic forces
associated with nanometer-scale magnetic probe tips.
Conventional MFM is not an intrinsically quantitative technique.
However, quantitative field mapping can be done with tiny field
probes based on mechanical detection of magnetic resonance in the
probe. We are developing ways to fabricate small magnetic-resonance
particles on ultra-sensitive cantilevers and position the particles
a few nanometers from the sample surface for field mapping with
1 nanometer resolution.
MEMS Magnetometer Development
We will provide new instruments based on highly specialized MEMS
chips fabricated at NIST. The instruments will be inexpensive, since
MEMS can be batch-fabricated in large quantities. In addition, large-scale
magnetic wafer properties can be transferred to smaller MEMS magnetometers
so that nanometer-scale measurements can be calibrated with reference
to fundamental units. In particular, our focus will be the development
of torque and force magnetometers, magnetic-resonance spectrometers,
and magnetic-resonance imaging (MRI) microscopes on MEMS chips.
Over the long term, we expect that this technology will lead to
atomic-scale magnetic instrumentation for the measurement and visualization
of fundamental magnetic phenomena.
Deliverables
In FY 2002, we will keep pace with the needs of industry in scanned
probe microscopy and magnetometry. During FY 2002-2004, we will
provide industry with new, inexpensive measurement systems that
are calibrated within the SI system of units. During FY 2002-2006,
we will develop techniques for visualization and comparison of fundamental
magnetic phenomena at the quantum level.
Scanning Probe Development
In FY 2002, we will achieve 20 nanometer MFM resolution.
By FY 2004, we will achieve 1 nanometer magnetic resonance imaging
resolution of thin-film ferromagnetic samples.
MEMS Magnetometer Development
In FY 2002, we will fabricate fully integrated MEMS magnetometers.
In FY 2002, we will develop active substrates, including disposable
MEMS sensors, for monitoring magnetic thin films during deposition
and processing to keep pace with the needs of industry.
By FY 2004, we will develop a magnetic resonance spectrometer
on a chip.
By FY 2006, we will develop atomic scale magnetism instrumentation.
By FY 2006, we will perform fundamental comparisons of spin systems
on a single MEMS sensor.
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